Monolithic micro-engineered mass spectrometer
US7208729B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 29, 2003 |
| Grant date | Apr 24, 2007 |
| Priority date | — |
| Expiry date | May 15, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/0018
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of constructing a micro-engineered mass spectrometer from bonded silicon-on-insulator (BSOI) wafers is described with reference to a quadrupole spectrometer. The quadrupole geometry is achieved using two BSOI wafers (200), which are bonded together to form a monolithic block (410). Deep etched features and springs formed in the outer silicon layers are used to locate cylindrical metallic electrode rods (300). The precision of the assembly is determined by a combination of lithography and deep etching, and by the mechanical definition of the bonded silicon layers. Deep etched features formed in the inner silicon layers are used to define ion entrance and ion collection optics. Other features such as fluidic channels may be incorporated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.