Simultaneous measurement of the reflectivity of X-ray with different orders of reflections and apparatus for measurement thereof
US7209542B2 · kind B2 · utility
1Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2005 |
| Grant date | Apr 24, 2007 |
| Priority date | — |
| Expiry date | Jul 8, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflections are measured based on Bragg's law, thereby measuring reflectivity of X-rays with different orders of reflections.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.