Method for forming a pattern of an organic semiconductor film
US7211120B2 · kind B2 · utility
2Cited by
2References
2Claims
0Family size
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Key dates
| Filing date | Nov 28, 2005 |
| Grant date | May 1, 2007 |
| Priority date | — |
| Expiry date | Nov 28, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/311
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for forming a pattern of an organic semiconductor film comprises applying at least a bicyclo compound onto a base material, the bicyclo compound being converted to an organic semiconductor on the base material through retro-Diels-Alder reaction which removes a part of the bicyclo skeleton to allow extension of pi electron system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.