Patent · US Expired

Apparatus and method for process monitoring

US7217393B2 · kind B2 · utility

3Cited by
11References
101Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 14, 2004
Grant dateMay 15, 2007
Priority date
Expiry dateMay 14, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T436/118339
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus is provided for testing fluid samples includes a sensor, which can be light source, directed to a flow cell and a photo sensor for detecting a light beam reflected from the flow cell. The photo sensor monitors the fluid in the flow cell by sensing the reflected light beam from the flow cell, thereby monitoring the test.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.