Processes for producing silane monomers and polymers and photoresist compositions comprising same
US7217490B2 · kind B2 · utility
0Cited by
17References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2003 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Mar 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.