Fluorinated polymers, photoresists and processes for microlithography

US7217495B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Andrew Edward Feiring · Wilmington, US
• Jerald Feldman · Wilmington, US
• Frank Leonard Schadt, III · Wilmington, US

Key dates

• Filing date: Jul 9, 2004
• Grant date: May 15, 2007
• Expiry date: Jul 9, 2024

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/108
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.