Hydroxy-amino thermally cured undercoat for 193 nm lithography
US7217497B2 · kind B2 · utility
0Cited by
34References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2004 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Jun 8, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.