Patent · US Expired

Method for making a wire nanostructure in a semiconductor film

US7217946B2 · kind B2 · utility

10Cited by
1References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 2, 2003
Grant dateMay 15, 2007
Priority date
Expiry dateMay 7, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/762
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

This invention relates to a process for manufacturing nanowire structures, the process comprising the following steps:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.