System for forming x-rays and method for using same
US7218700B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2005 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Feb 1, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/068
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for forming x-rays. One exemplary system includes a target and electron emission subsystem with a plurality of electron sources. Each of the plurality of electron sources is configured to generate a plurality of discrete spots on the target from which x-rays are emitted. Another exemplary system includes a target, an electron emission subsystem with a plurality of electron sources, each of which generates at least one of the plurality of spots on the target, and a transient beam protection subsystem for protecting the electron emission subsystem from transient beam currents, material emissions from the target, and electric field transients.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.