Method and apparatus for supercritical ozone treatment of a substrate
US7219677B1 · kind B1 · utility
15Cited by
3References
18Claims
0Family size
Inventor
Key dates
| Filing date | Jul 31, 2001 |
| Grant date | May 22, 2007 |
| Priority date | — |
| Expiry date | Apr 14, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized water, nonaqueous, e.g., formed of a dense fluid, such as supercritical carbon dioxide, liquid carbon dioxide, supercritical nitrogen or combinations the dense fluids or the feed phase can be a mixture of aqueous and nonaqueous phases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.