Process for coating substrates using vapour deposition
US7220450B2 · kind B2 · utility
5Cited by
16References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2001 |
| Grant date | May 22, 2007 |
| Priority date | — |
| Expiry date | Jul 17, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.