Sub-wavelength structures for reduction of reflective properties
US7220621B2 · kind B2 · utility
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5References
25Claims
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Key dates
| Filing date | Oct 19, 2004 |
| Grant date | May 22, 2007 |
| Priority date | — |
| Expiry date | Mar 17, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B7/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for manufacturing optically-transparent lids includes etching sub-wavelength structures on a surface of a lid wafer. The structures may be arrayed in a hexagonally closed-packed pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.