Pulse thermal processing of functional materials using directed plasma arc
US7220936B2 · kind B2 · utility
17Cited by
9References
36Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 30, 2004 |
| Grant date | May 22, 2007 |
| Priority date | — |
| Expiry date | Sep 8, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of thermally processing a material includes exposing the material to at least one pulse of infrared light emitted from a directed plasma arc to thermally process the material, the pulse having a duration of no more than 10 s.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.