Patent · US Expired

Patterning magnetic nanostructures

US7223438B2 · kind B2 · utility

15Cited by
6References
75Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 17, 2003
Grant dateMay 29, 2007
Priority date
Expiry dateJun 25, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y25/00
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A direct-write method for fabricating magnetic nanostructures, including hard magnetic nanostructures of barium hexaferrite, BaFe, based on nanolithographic printing and a sol-gel process. This method utilizes a conventional atomic force microscope tip, coated with a magnetic material precursor solution, to generate patterns that can be post-treated at elevated temperature to generate magnetic features consisting of barium ferrite in its hexagonal magnetoplumbite (M-type) structure. Features ranging from several hundred nm down to below 100 nm were generated and studied using AFM, magnetic force microscopy, and X-ray photoelectron spectroscopy. The approach offers a new way for patterning functional inorganic magnetic nanostructures with deliberate control over feature size and shape, as well as interfeature distance and location.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.