Helium ion generation method and apparatus
US7223984B2 · kind B2 · utility
3Cited by
12References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2002 |
| Grant date | May 29, 2007 |
| Priority date | — |
| Expiry date | Apr 3, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2658
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention provides methods and apparatus for generating helium ions. The methods involve providing a mixture of helium gas with a second gas in an ion source. The second gas has a lower ionization potential and larger molecules than that of helium. The helium gas is ionized by generating an arc discharge within the ion source. The presence of the second gas enhances the ionization of the helium gas. The increased helium ionization enables formation of helium ion beams having a high beam currents suitable for implantation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.