Method, dielectric element, and MR system for generating an MR exposure

US7224165B2 · kind B2 · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Thorsten Feiweier · Peising, DE
• Berthold Kiefer · Erlangen, DE
• Wolfgang Renz · Erlangen, DE
• Lothar Schön · Neunkirchen, DE

Key dates

• Filing date: Feb 10, 2005
• Grant date: May 29, 2007
• Expiry date: Mar 30, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G01R33/5659
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

For generating of magnetic resonance exposures of an examination subject, a dielectric element with high dielectric constant is positioned on the examination subject to locally influence the B1 field distribution, the dielectric element being formed primarily of material whose magnetic resonance line(s) is/are shifted by at least a specific degree relative to the magnetic resonance line of water protons for a given magnetic field. In a measurement for generation of a magnetic resonance exposure a measurement sequence is used, such in the acquisition of the raw image data the dielectric material of the dielectric element supplies no signal contributions for the image generation and/or the signals caused by the dielectric material of the dielectric element can be separated from the signals caused by the examination subject.