Inkjet head and a method of manufacturing the same
US7226150B2 · kind B2 · utility
41Cited by
3References
8Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 14, 2004 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | Jan 21, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2002/14419
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An inkjet head is provided and includes: a chamber substrate for forming an ink flow passage; a diaphragm substrate including a diaphragm for pressurizing a pressure chamber disposed in the chamber substrate; and a nozzle substrate for jetting ink pressurized by the diaphragm, wherein the diaphragm substrate is made of silicon, the diaphragm is made of a material selected from the group of silicon oxide film and metal film, and the diaphragm is formed in the diaphragm substrate. A method of manufacturing the inkjet head is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.