Method and system for decreasing the effective pulse repetition frequency of a laser
US7227098B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2004 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | Aug 31, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2101/40
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Methods and systems operate a machine having a laser characterized by a PRF (pulse repetition frequency) parameter that specifies a PRF at which pulses produced by the laser have desirable pulse properties for irradiating structures on or within a workpiece. The structures are arranged on the workpiece in a linear pattern having an approximately equal pitch between adjacent structures. The laser emits a laser pulse that propagates along a laser beam propagation path terminating at a laser beam spot on the workpiece. The method is effective to move the laser beam spot across the structures along the linear pattern at a speed greater than the product of the PRF and the pitch to selectively irradiate selected ones of the structures with the laser without substantially degrading the desirable pulse properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.