Birefringence optical element and manufacturing method thereof
US7227689B2 · kind B2 · utility
1Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2004 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | Aug 13, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/3083
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask with an opening pattern is placed on a substrate, and etching is carried out by use of anisotropy etching of crystal. The opening pattern of the mask is composed of broken lines, each of which is discontinued by discontinuing portions. By the etching, a birefringence optical element with a fine structure, in which trenches, each of which is discontinued by discontinuing portions, are juxtaposed periodically at a specified pitch, is obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.