Patent · US Expired

Methods and devices for high throughput crystallization

US7229500B2 · kind B2 · utility

21Cited by
5References
64Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 20, 2001
Grant dateJun 12, 2007
Priority date
Expiry dateMar 28, 2023

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC40B60/14
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Crystallization Photoresist (PR) apparatus and methods which allow for fast screening and determination of protein crystallization conditions with small protein quantities and rapid crystallization. The apparatus comprise a first region comprising a first nucleation catalyst material and a second region comprising a second nucleation catalyst material, with the first and second regions positioned adjacent to each other and configured to support at least one crystal, and with the first region having a variation in a nucleation property of the first nucleation catalyst material in the first region. The crystal may be supported at an interface of the adjacent regions. The methods comprise providing a first region of a first nucleation catalyst material and a second region of a second nucleation catalyst material adjacent said first region, with the first region having a variation in a nucleation property of the first nucleation catalyst material, exposing the first and second regions to a solution of a selected molecule, and growing at least one crystal of the molecule in association with the first and second regions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.