Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal
US7229588B2 · kind B2 · utility
7Cited by
26References
24Claims
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Key dates
| Filing date | Jan 13, 2004 |
| Grant date | Jun 12, 2007 |
| Priority date | — |
| Expiry date | Aug 6, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/183
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.