Gas barrier substrate
US7229703B2 · kind B2 · utility
15Cited by
4References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2004 |
| Grant date | Jun 12, 2007 |
| Priority date | — |
| Expiry date | Feb 23, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The main object of the present invention is to provide a gas barrier substrate having a high gas barrier property without a ruggedness, a pin hole or the like in the gas barrier layer. The present invention solves the problem by providing a gas barrier substrate having a base material, a planarization layer formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.