Interference pattern testing of materials
US7231304B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 30, 2005 |
| Grant date | Jun 12, 2007 |
| Priority date | — |
| Expiry date | Oct 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/015
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods, systems, and articles of manufacture consistent with the present invention identify a flaw in a structure by comparing a first interference pattern resulting from a first wave signal and a second wave signal propagating through the structure to a second interference pattern resulting from the first wave signal and the second wave signal propagating through the structure. The second interference pattern is obtained after obtaining the first interference pattern. It is determined whether there is a flaw in the structure by determining whether the first interference pattern deviates from the second interference pattern by a predetermined variance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.