Cathode for vacuum sputtering treatment machine
US7235162B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2005 |
| Grant date | Jun 26, 2007 |
| Priority date | — |
| Expiry date | Jul 15, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3435
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cathode for a vacuum sputtering processing machine includes a target plate mounted on a support having a cooler. The support is secured to a frame delimiting a closed space for positioning and centering the target. The frame peripherally has a profiled catching rim configured to collaborate with a set of independent gripping elements having complementary catching shapes configured to allow an effect of tilting of the elements resulting from a clamping action exerted on members engaged in a thickness of the elements, and bearing against a part of the catching rim of the frame, so that, under the tilting effect, a part of the catching shapes of the set of gripping elements bears facially against a peripheral edge of the target plate to secure the target plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.