Patent · US Expired

Non-intrusive photogrammetric targets

US7235280B2 · kind B2 · utility

0Cited by
14References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 12, 2003
Grant dateJun 26, 2007
Priority date
Expiry dateDec 13, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01C11/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A target for use in photogrammetric analysis that does not distort the object to be analyzed has been developed. The target is formed by mixing a diffuse material with a solvent and then applying the mixture to the surface of the object to be analyzed. The object is then coated with a reflective material so that the diffuse material forms a reflective target suitable for use in photogrammetric analysis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.