Full-width array sensing of two-dimensional residual mass structure to enable mitigation of specific defects
US7236711B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2005 |
| Grant date | Jun 26, 2007 |
| Priority date | — |
| Expiry date | Feb 23, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G2215/00059
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A defect analysis system for a xerographic print engine includes a residual mass sensor that senses the two-dimensional signature structure of residual mass remaining on a photoconductive or other substrate surface after image transfer. Preferably, the sensor is a full width array that spans substantially an entire width of the photoconductive surface. This information is then processed and analyzed to determine a specific type of transfer defect present. This may include the quantified level of defect for each detected type. The defect analysis system may also include a closed-loop control system that can adjust various xerographic process parameters using feedback based on the identification and optionally magnitude of each specific defect type. The identified print quality defect, such as mottle, streaks, point deletions, graininess, etc. can then be used to determine a customized corrective control action to be taken by the feedback control of the xerographic print engine to remedy or compensate for the defect(s).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.