Method for protecting write head coil during write pole/shaping
US7243411B2 · kind B2 · utility
0Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2005 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | Sep 2, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49064
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.