Retaining wall system
US7244079B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2005 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | Sep 15, 2025 |
Classification
- Technology area (CPC E)Fixed Constructions
- CPC primaryE04B2002/0245
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
A retaining wall system is comprised of a plurality of courses of side-by-side parallelogram front face patterns, each parallelogram front face pattern formed by first and second rows of a plurality of quadrilateral face patterns. The first and second rows of the plurality of quadrilateral face patterns have the same width and collectively define a height of the parallelogram front face pattern, with each of the parallelogram front face patterns having the same height. The quadrilateral face patterns in the first row have a width different than that of the quadrilateral face patterns in the second row. Each parallelogram front face pattern in a first course overlies two parallelogram front face patterns in an immediately adjacent course. The combination of off-sets of the quadrilateral face patterns in each parallelogram front face pattern and overlapping of parallelogram face patterns in adjacent courses creates a retaining wall having a non-uniform appearance of a natural stone wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.