Antireflection film and object having undergone antireflection treatment
US7244494B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 25, 2003 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | Oct 18, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31504
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an antireflection film for transfer that can be transferred to the surface of plates or other less-flexible articles to form an antireflection layer with a uniform thickness that not only provides a high antireflection effect on a light in the visible light range but also offers a high solvent resistance. The present invention also provides an antireflection-treated article. An antireflection film for transfer comprising a support (1); an antireflection layer (2) comprising a low refractive index layer (2a) disposed on the support (1) and a high refractive index layer (2b) disposed on the low refractive index layer and having a higher refractive index than the refractive index of the low refractive index layer; and an adhesive layer (3) on the antireflection layer (2), wherein the high refractive index layer (2b) contains metal oxide fine particles, and a photopolymerization initiator and/or a photosensitizer, the adhesive which constitutes the adhesive layer (3) is an active energy ray-curable adhesive and the high refractive index layer (2b) is impregnated with a portion of the adhesive, and the support (1) is releasable from the antireflection laye…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.