Patterning of devices
US7244669B2 · kind B2 · utility
19Cited by
9References
57Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 2002 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | May 22, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/115
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for forming an organic or partly organic switching device, comprising: depositing layers of conducting, semiconducting, insulating, or surface modifying layers by solution processing and direct printing; and defining high-resolution patterns of these layers by exposure to a focused laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.