Patent · US Expired

Method for the production of aqueous polymer dispersions containing very few residual monomers and use thereof

US7244812B2 · kind B2 · utility

6Cited by
7References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 26, 2003
Grant dateJul 17, 2007
Priority date
Expiry dateAug 4, 2023

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F6/006
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The invention relates to a method for reducing the amount of residual monomers in aqueous polymer dispersions means of chemical post-treatment. Post-treatment in the aqueous polymer dispersion is carried out by adding a redox system which contains a) 0.005-5 wt. % of an oxidation agent which contains an organic peroxide. and b) 0.005-5 wt. % of a reduction agent which contains sulfinic acids or salts thereof. Additionally the redox system can, optionally, contain catalytic amounts of a polyvalent metallic ion which can be treated in several valent stages. Post-treatment can be carried out at a temperature ranging from 20-100.degree. C. and at a PH-value ranging from 2-9. The invention also relates to the use of the inventive post-treated polymer dispersion for producing adhesives, coatings, powders, constructive chemical products or for refining textiles or paper.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.