Method of optimizing optical power use in a parallel processing laser system
US7244907B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 30, 2004 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | Aug 8, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/52
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention relates to optimizing optical power from a laser processing system, and more specifically to a method of optimizing the optical power by employing parallel laser processing techniques to maximize fabrication quality and yield. The method in the present invention includes the steps of: determining the specification for the final product, selecting the proper combination of optical power and processing method for processing a single feature, determining the maximum number of features in pattern to be parallel processed, selecting a portion of the desired pattern that can be parallel processed, designing the DOEs, manufacturing the DOEs, incorporating the DOE into laser processing system, operating and controlling the laser processing system, and determining if more DOEs are needed to complete the laser processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.