Patent · US Expired

Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure

US7245406B2 · kind B2 · utility

3Cited by
4References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 16, 2004
Grant dateJul 17, 2007
Priority date
Expiry dateMay 29, 2025

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2230/10
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for forming fine concavo-convex patterns by using a relief formation material 3 having a relief formation layer 2 composed of a resin having thermoplasticity and a relief pattern sheet 6 having on a surface thereof fine concavo-convex patterns 5, wherein a photothermal conversion layer 7 is formed in the relief formation material 3 or the relief pattern sheet 6; the photothermal conversion layer 7 is irradiated with light 8 to make the photothermal conversion layer 7 generate heat in the state that the relief formation layer 2 is brought into contact with the fine concavo-convex patterns 5; and the fine concavo-convex patterns 5 are formed on the relief formation layer 2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.