Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development
US7247344B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Nov 16, 2004 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Feb 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a method and an apparatus for applying a surface treatment composition to a photosensitive printing element during thermal processing. A photosensitive printing element is contacted with a web of absorbent material that is capable of absorbing material that is melted or softened from an imaged and exposed surface of a photosensitive printing element. The web of absorbent material is coated with a surface treatment composition to transfer the surface treatment composition from the web of absorbent material to the imaged and exposed surface of the photosensitive printing element. Applying the surface treatment composition during thermal processing provides for more complete and more uniform coverage of the surface treatment composition on the photosensitive printing element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.