Imageable members with improved chemical resistance

US7247418B2 · kind B2 · utility

Assignee

• EASTMAN KODAK COMPANY · US

Inventors

• Shashikant Saraiya · Fort Collins, US
• Jayanti Patel · Fort Collins, US
• Ting Tao · Fort Collins, US
• Kevin Ray · Windham, US
• Frederic E. Mikell · Greeley, US
• James Mulligan · Fort Collins, US
• John Kalamen · Loveland, US
• Scott A. Beckley · Windsor, US
• Eric E. Clark · Loveland, US

Key dates

• Filing date: Dec 1, 2005
• Grant date: Jul 24, 2007
• Expiry date: Dec 1, 2025

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/165
• WIPO field: Textile and paper machines
• WIPO sector: Mechanical engineering

Abstract

Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.