Patent · US Expired

High Q inductor integration

US7247544B1 · kind B1 · utility

2Cited by
8References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 12, 2002
Grant dateJul 24, 2007
Priority date
Expiry dateApr 12, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In an inductor integration process, a high Q inductor is achieved by forming an AlCu inductor via prior to depositing the inductor dielectric.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.