Method for manufacturing a transparent element with invisible electrodes
US7247568B2 · kind B2 · utility
4Cited by
5References
11Claims
0Family size
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Key dates
| Filing date | Nov 30, 2004 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Feb 17, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/811
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A conductive pattern, made of a transparent conductive oxide, such as ITO including electrodes (2) and conductive paths (4) is formed on one face of a transparent substrate (3) made of sapphire or toughened glass, then coated with a first layer (5) of a transparent dielectric with a low refractive index, such as MgF2 or LiF2, and then a second layer (7) of another transparent dielectric having a higher refractive index than the first, such as Al2O3, Ta2O5 or DLC.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.