Method to trim and smooth high index contrast waveguide structures
US7248773B2 · kind B2 · utility
4Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2006 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Dec 4, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31116
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.