Synthesis of photoresist polymers
US7250475B2 · kind B2 · utility
1Cited by
38References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2004 |
| Grant date | Jul 31, 2007 |
| Priority date | — |
| Expiry date | Jun 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.