High power, long focus electron source for beam processing
US7250727B2 · kind B2 · utility
1Cited by
6References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 2, 2005 |
| Grant date | Jul 31, 2007 |
| Priority date | — |
| Expiry date | Sep 29, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.