Deposition method for nanostructure materials
US7252749B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2001 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Nov 30, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D13/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing a coating of a nanostructure material onto a substrate includes: (1) forming a solution or suspension of containing the nanostructure material; (2) selectively adding “chargers” to the solution; (3) immersing electrodes in the solution, the substrate upon which the nanostructure material is to be deposited acting as one of the electrodes; (4) applying a direct and/or alternating current electrical field between the two electrodes for a certain period of time thereby causing the nanostructure materials in the solution to migrate toward and attach themselves to the substrate electrode; and (5) subsequent optional processing of the coated substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.