Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same
US7256221B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2003 |
| Grant date | Aug 14, 2007 |
| Priority date | — |
| Expiry date | Mar 9, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08C19/02
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.