Composition for forming organic insulating film and organic insulating film formed from the same
US7256419B2 · kind B2 · utility
3Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2004 |
| Grant date | Aug 14, 2007 |
| Priority date | — |
| Expiry date | Oct 27, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K10/471
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed herein is a composition for forming an organic insulating film and an organic insulating film formed from the composition. An exemplary composition comprises an insulating polymer having a maleimide structure, a crosslinking agent and a photoacid generator so as to form a crosslinked structure. The organic insulating film has excellent chemical resistance to organic solvents used in a subsequent photolithographic process and can improve the electrical properties of transistors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.