Sensor alignment apparatus for an analysis system
US7256891B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2004 |
| Grant date | Aug 14, 2007 |
| Priority date | — |
| Expiry date | Mar 12, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S248/913
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for analyzing a population of particles is set forth. The apparatus includes an emitter adapted to generate a beam of electromagnetic radiation, such as from a laser, and a particle chamber disposed in a path of the electromagnetic radiation beam. The apparatus also includes a sensor to detect electromagnetic radiation scattered by or otherwise received from the particle chamber. A sensor alignment unit supports the sensor along a detection axis and allows adjustment of the position of the sensor along orthogonal axes lying in a plane that is generally perpendicular to the detection axis. In one embodiment, the sensor alignment unit includes a first support platform and a first adjustment mechanism disposed to adjust the position of the first support platform along a first orthogonal axis. The sensor alignment unit also includes a second support platform that supports the sensor. The second support platform is connected to the first support platform in such a manner as to allow the second support platform to move along a second orthogonal axis. A second adjustment mechanism is provided to adjust the position of the second support platform with respect to the first supp…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.