System and method for monitoring semiconductor production apparatus
US7257457B2 · kind B2 · utility
17Cited by
13References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2003 |
| Grant date | Aug 14, 2007 |
| Priority date | — |
| Expiry date | Jan 20, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A plurality of pieces of process data are acquired from a semiconductor production apparatus while it is in operation, and then, a multivariate analysis model is created using at least a portion of the plurality of pieces of process data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.