Exposure mask device and method for orienting a plurality of substrates on an exposure mask
US7257890B2 · kind B2 · utility
0Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2002 |
| Grant date | Aug 21, 2007 |
| Priority date | — |
| Expiry date | May 5, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53261
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.