Process for preparing metal coatings from liquid solutions utilizing cold plasma
US7258899B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2002 |
| Grant date | Aug 21, 2007 |
| Priority date | — |
| Expiry date | Jul 12, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/145
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing metals, metal blends and alloys onto substrate surfaces, including microporous substrates utilizing a plasma operation undertaken at room temperature. In the process, a liquid solution of a monomer or comonomer precursor having a metallic component is utilized to wet the surface of the substrate, with the solvent portion thereafter being removed to leave the substrate surface coated with a dry deposit. The coated substrate is then introduced into a plasma reaction chamber with RF energy being applied across spaced electrodes to create a plasma glow along with the introduction of a plasma supporting gas. The substrate is exposed to the plasma glow for conversion of the precursor to dissociated form to create a deposit consisting essentially of the metallic component in elemental form as a cohesive film on the substrate surface. Preferred metals include such noble metals as platinum, gold and silver, as well as other metals. Preferred precursors include platinum hexafluoro-acetylacetonate, (trimethyl) methylcyclopentadienyl platinum, dimethyl(acetylacetonate) gold, and trimethyl phosphine (hexafluoroacetyl acetonate) silver.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.