Hard laminated film, method of manufacturing the same and film-forming device
US7258912B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2005 |
| Grant date | Aug 21, 2007 |
| Priority date | — |
| Expiry date | Jan 31, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less.Layer A has a cubic rock-salt crystal structure such as that of Ti, Cr, Al, V nitride, carbonitride or carbide, and layer B is a hard film having a crystal structure other than cubic such as that of BN, BCN, SiN, SiC, SiCN, B—C, Cu, CuN, CuCN or metallic Cu. Alternatively, layer A has a chemical composition satisfying the following formula (1), and layer B has a chemical composition satisfying the following formula (2).Layer A: Cr(BaCbN1-a-b-cOc)0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0.2≦e≦1.1 (1)Layer B: B1-s-tCsNt0≦s 0.25, (1-s-t)/t≦1.5 (2)Alternatively, Layer A has a specific atomic ratio composition of (Ti1-x-yAlxMy)(BaCbN1-a-b-cOc) and Layer B has one or more specific atomic ratio compositions selected from among the compositions B1-x-yCxNy, Si1-x-yCxNy, C1-xNx, Cu1-y(CxN1-x)y. Alternatively, Layer A has one of the follow…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.