Optical recording medium, process for manufacturing the same, sputtering target for manufacturing the same, and optical recording process using the same
US7260053B2 · kind B2 · utility
6Cited by
15References
39Claims
0Family size
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Key dates
| Filing date | Jun 4, 2003 |
| Grant date | Aug 21, 2007 |
| Priority date | — |
| Expiry date | Mar 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/24314
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical recording medium which comprises a substrate and a recording layer disposed on the substrate, in which the recording layer comprises Ga and Sb, a content of the Sb is 80 atm % to 95 atm % relative to a total content of the Ga and the Sb in the recording layer, and recording and erasing are carried out by a reversible phase change between an amorphous phase and a crystalline phase in the recording layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.