Rotation-rate sensor
US7260991B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2003 |
| Grant date | Aug 28, 2007 |
| Priority date | — |
| Expiry date | Feb 25, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C19/5712
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A micromechanical rotation-rate sensor includes a substrate, an anchoring device provided on the substrate, as well as a first spiral spring device and a second spiral spring device, the two spiral spring devices being provided next to one another in mirror symmetry along their greatest extension, and the two spiral spring devices together form one spiral spring apparatus. The sensor further includes a centrifugal mass connected to the anchoring device via the first spiral spring device connected to the centrifugal mass so that the centrifugal mass is elastically deflectable from its neutral position, about a rotational axis situated perpendicularly to a substrate surface, so that the centrifugal mass is capable of rotary oscillation. In addition, the first spiral spring device includes a bend at its anchoring region with the anchoring device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.